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FORMATION OF THIN-FILM MICRO-PATTERNS ON THE REVERSE SIDE OF IRRADIATED SUBSTRATE BY THE INTERFERENCE LCVD TECHNIQUE

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One-stage laser interferential chemical deposition of thin film periodical micro- and nanostructures from vapor phase without application of photolithography masks is studied experimentally. The experimental setup includes YAG:Nd3+ laser, vacuum chamber for process of structure deposition from volatile metal’s carbonyl vapor with transparent window for inletting laser irradiation into the chamber, opticalmechanical set to split the initial front into two coherent beams forming two-beam interference pattern on surface of transparent substrate. Dirhenium decacarbonyl is used as typical metalorganic compound. Results of the experiments are used to test a theoretical model describing the process of onestage laser interferential chemical deposition from vapor phase; in accordance with the model, the critical point is shown to be the pyrolysis process taking place mainly in the monolayer of carbonyl molecules adsorbed on the surface of transparent substrate. Application of two-beam interference is reported to provide a higher resolution of periodic topological pattern than projection photolithography and direct laser drawing.

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