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THE CONDITION FOR OBTAINING A CONSTANT REFLECTION COEFFICIENT FROM SPHERICAL SURFACES OF GREAT CURVATURE

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A method is proposed to increase the size of enlightenment area defined as the ratio of the radius for the optical element surface, where the reflection is less than a certain value, to the element radius. The increase is achieved due to the use of a circular diaphragm, located between the evaporator and the substrate, which shields a part of the evaporated molecular flow and redistributes it over a specified por-tion on surface of the optical element. It is shown that the size of the enlightenment area increases by 17% when a single-layer antireflection coating with refractive index ni = 1,35 is formed on the surface of large-curvature optical element (radius R = 10 mm) made of a material with the refractive index nm = 1,52. Analysis of factors influencing the size of the enlightenment area is carried out for the case when a circular diaphragm is used, and distribution of the reflection coefficient of single-layer antireflection coating over the surface of large-curvature optical element is demonstrated. 

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