CREATION OF THIN-FILM MULTILAYER STRUCTURES BY MAGNETRON SPUTTERING AND THEIR ELEMENTAL ANALYSIS
Annotation
The process of formation of a multilayer Al-Ni structure by the magnetron sputtering method used for the reaction of self-propagating high-temperature synthesis is considered. The magnetron sputtering system arrangement is proposed, which allows using six magnetrons and an ion source in a single technological cycle of formation of a multilayer Al-Ni structure, which leads to an increase in the rate of its growth. A sample of the obtained Al-Ni structure is studied using scanning electron microscopy. It is shown that the sample has a thickness of 50 μm, the thickness of one bilayer is 80 nm. The results of studying the obtained structures using Auger spectroscopy and scanning electron microscopy are presented, and an elemental analysis of the formed multilayer structure is carried out.
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