Journal
Scientific and technical journal «Priborostroenie»
UDK681.7.069.225:537.53
Issue:6 (52)
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HIGH-POWER CW SOURCE OF EXTREME VUV RADIATION FOR PROCESSING OF SEMICONDUCTOR MATERI
Annotation
Application of existing sources of CW extreme VUV radiation is restricted by their large size, low efficiency, high cost, and small irradiated area. A novel type of arc-discharge source of extreme VUV radiation (75—10 nm) with the power of ~ 10 kW and efficiency of ~ 10 % (at least for the range of 70—30 nm) is described. The new sources are easy to manufacture; they have a lifetime of about 1000 h and are capable of irradiating samples with total surface area of ~ 0,1—1 m2.
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