Journal
Scientific and technical journal of information technologies, mechanics and optics
UDK621.315.592; 621.315.51.6; 621.3.049.77.14
Issue:6 (64)
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THE INFLUENCE OF YLP - LASER RADIATION ON THE CURRENT-VOLTAGE CHARACTERISTICS OF THE SILICON-SILICON DIOXIDE SYSTEM
Annotation
The paper presents the results of the experiment concerning irradiation of thermally oxidized silicon wafer by pulsed fiber YLP-laser with 1.06 microns wavelength and different power density. It is shown that defects appear in the SiO2 film under laser irradiation responsible for the increase of a negative charge in the dielectric and the conductivity of SiO2 for certain values of the shutter bias voltage.
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