SELECTION CRITERIA FOR TECHNOLOGY OF OPTICAL SURFACE FORMATION FOR SUBMILLIMETER WAVELENGTH LENS
Annotation
The possibility to optimize lens optical surface formation for submillimeter spectrum is considered. The presented analysis is based on image quality criteria and takes into account the manufacturing tolerances (dimensional tolerance, form tolerance, position tolerance, allowable roughness) and the labor costs for materials transparent in the submillimetre range (polyethylene, crystal quartz, polyethylene terephthalate, α –saphire, silicon).
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