Journal
Scientific and technical journal «Priborostroenie»
UDK535.51
Issue:1 (52)
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ELLIPSOMETRY OF INHOMOGENEOUS SURFACE LAYERS OF ANISOTROPICAL OPTICAL ELEMENTS
Annotation
Methods of definition of elements of the normalized matrix of reflection and the basic ellipsometry parameters of anisotropical reflecting systems are presented. The experimental-theoretical substantiation of application of ellipsometry generalized equations in Drude — Born approach is given at definition of optical characteristics of non-uniform superficial layers of anisotropical elements of optoelectronics. It is shown, that at polishing and ionic processing of crystal quartz it is formed amorpheous layer which presence leads to losses of optical radiation.
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