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ТЕХНОЛОГИЧЕСКИЕ ОСОБЕННОСТИ ВЫБОРА МАТЕРИАЛОВ И МЕТОДОВ НАПЫЛЕНИЯ УЗЛОВ ГИРОПРИБОРОВ

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It is shown, that the silicon nanoclusters within layers SiO2 can have the various form and structure. In cases when silicon nanoclusters are formed on silicon substrates by methods nanolithography of surfaces with the subsequent thermal oxidation or a laser irradiation of the oxidized silicon, nanoclusters usually have crystal structure. At use of other methods of formation silicon nanoclusters for reception of diamondlike structures of these clusters, the additional processing is usually required, in particular, high-temperature anneal.

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