FORMATION OF SIO2/SI SYSTEM MORPHOLOGY UNDER THE ACTION OF EXCIMER LASER RADIATION
Annotation
Formation of micro-and nano-scale periodic structures on the surface of SiO2/Si system with the use of nanosecond laser pulses is investigated. Exposure of experimental samples to ultraviolet ArF laser pulse (193 nm) is shown to produce periodic wave-like structures on the surface. The dependence of the surface topology of SiO2/Si system on the laser pulse energy density and on the number of pulses is studied.
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