Journal
Scientific and technical journal of information technologies, mechanics and optics
UDK546.571 (621.793.79)
Issue:3 (91)
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MODIFICATION OF SURFACE LAYERS FOR SILICATE GLASSES BY ELECTRON IRRADIATION
Annotation
Experimental research results of silicate glass surface layers modification by the influence of electron beams with 5-50 keV energies and 20-50 mC/cm2 doses are presented. It is shown that during the glasses exposure to an electron beam with 20-50 keV electron energies, a gradient optical waveguide with increased refractive index on waveguide axis Δn = 0.01-0.04 is formed in the surface layer. Сhemical etching rate is increased in the exposed area by up to two times which is related to glass grid destruction. Depending on irradiation dose thin film or silver nanoparticles with the size less than 20nm are formed on the surface of the silver containing glasses for electron energies less than 10 keV. Silver films drawn on the surface of the glass are dissolved into the glass bulk for electron energies 20-50 keV and 20-50 mC/cm2 dose. Basic mechanisms causing these effects are: chemical bonds breaking of spatial glass grid by high energy electrons, formation of negative volume charge inside the glass and field migration of positive metal ions into the volume charge region. Achieved results can be used in photonics, integral optics and nanoplasmonics device fabrication.
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